일반, EUV Photomask에 특화된 박막 분석 및 OCD Profile 제공 (Reflectance & Trasmittance)
The n&k Gemini system uses simultaneous polarized Reflectance(R) and polarized Transmittance(T) data to determine the optical properties (n and k), thicknesses and critical dimensions of the structures being analyzed. This fully-automated system is configured for Conventional and EUV Photomask applications. By using Micro-Spot Technology for both R and T and acquiring data over a wide wavelength range (190 – 1000nm) with optimized signal-to-noise ratio, the Class 1 Clean Room Compatible n&k Gemini is ideal for characterizing the increasingly smaller features in current-generation and next-generation products. On the software end, a valid physical model combines the Forouhi-Bloomer Dispersion Equations for n and k and Rigorous Coupled Wave Analysis (RCWA) to analyze raw R and T data. The n&k Gemini-M is an alternative system that uses the same optical configuration and analysis capabilities as the n&k Gemini, but without the automated loading system, enabling versatile, cost-effective metrology for Conventional and EUV Photomask applications.