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SC-1 ¿ë¾×ÀÇ CalibrationÀ» À§ÇÏ¿©, °¢°¢ÀÇ Ç¥ÁØ¿ë¾×Àº NH4OH ¿ë¾×À» 0 - 4.6% ¹üÀ§ »çÀÌ·Î ³Ö¾úÀ¸¸ç, H2O2µµ °°Àº ³óµµ ¹üÀ§·Î ³Ö¾ú´Ù. ÀÌ ¿ë¾×ÀÇ ´ëºÎºÐ (¾à 91.5% - 100%)Àº ÃÊ°í¼øµµÀÇ DI Water·Î ±¸¼ºµÇ¾ú´Ù. °¢°¢ÀÇ Ç¥ÁØ»ùÇõéÀº Air background·Î 4¹ø¾¿ ÃøÁ¤µÇ¾úÀ¸¸ç, ÀÌ´Â Figure3¿¡¼­ º¸´Â °Í°ú °°ÀÌ ¸ðµÎ °ãÃÄÁ®¼­ °¢°¢ÀÇ Â÷À̸¦ °ÅÀÇ ±¸º°ÇÒ ¼ö ¾ø´Ù. ÇÏÁö¸¸ ÀÚ¼¼È÷ µé¿©´Ù º¸¸é °¢°¢ÀÇ ³óµµ Â÷¿¡ µû¶ó Spectrum¿¡ ¹Ì¼¼ÇÑ Â÷ÀÌ°¡ ³ªÅ¸³ª´Â °ÍÀ» °üÂûÇÒ ¼ö ÀÖ´Ù(Figure4).


[Figure3. Raw SC-1 spectra collected with an air reference]


[Figure4. Zoomed view of the spectral peak region for
SC-1 raw spectra]

¿øº» SpectrumÀ» º¸¸é, 1300nm - 1650nmÀÇ ¹üÀ§¿¡¼­ °Ë·®°î¼±À» ±×¸®±â À§ÇØ ÀûÇÕÇÏ´Ù´Â °ÍÀ» ¾Ë ¼ö Àִµ¥, À̸¦ 1Â÷ ¹ÌºÐÇÏ°Ô µÇ¸é ½ºÆåÆ®·³ÀÇ Â÷À̸¦ ´õ¿í È®¿¬È÷ È®ÀÎÇÒ ¼ö ÀÖÀ¸¹Ç·Î SpectrumÀÇ 1Â÷ ¹ÌºÐÀÌ ¸Å¿ì È¿À²ÀûÀ¸·Î »ç¿ëµÈ´Ù(Figure5).


[Figure5. First derivatives of SC-1 calibration spectra]

Chemometric Software¸¦ ÀÌ¿ëÇÏ¿© SC-1 Solution ³»¿¡ µé¾îÀÖ´Â 3°¡ÁöÀÇ È­Çй°Áúµé¿¡ ´ëÇØ °Ë·®°î¼±À» ±×¸°´Ù. Figure5-7±îÁö°¡ NH4OH, % H2O2, %Water¿¡ ´ëÇÑ °Ë·®°î¼±À» È®ÀÎÇÒ ¼ö ÀÖ´Ù. °á°ú°ª°ú ¿¹ÃøÄ¡ÀÇ ³óµµ¸¦ ºñ±³ÇØ º¸¸é ¸ðµç °á°ú´Â ½ÇÇè¿¡ »ç¿ëÇϱ⠸ſì ÀûÇÕÇÑ °ÍÀ» È®ÀÎÇÒ ¼ö ÀÖ´Ù.


[Figure6. Measured vs. predicted results for
%NH4OH in SC-1 cleaning]


[Figure7. Measured vs. predicted results for
% H2O2 in SC-1 cleaning]


[Figure8. Measure vs. predicted results for % Water in SC-1 solution]


[Table2. Prediction summary for varied mixture SC-1 solutions]

³ª¸ÓÁö ´Ù¸¥ BathµéÀÇ ¿ë¾×µµ °°Àº ¹æ¹ýÀ¸·Î °Ë·®°î¼±À» ±×¸®°í ½ÇÇè¿¡ ÀÓÇÏ¿´À¸¸ç, °Ë·®°î¼± °ªÀº ½ÇÇèÀ» Çϱ⿡ ¸Å¿ì ÀûÇÕÇÏ°Ô ³ª¿Ô´Ù.


[Figure9. HF:H2O Spectra]


[Figure10. HF Prediction in PLS calibration set]

Cleaning & Etching BathÀÇ ½Ç½Ã°£ ¸ð´ÏÅ͸µÀ» À§ÇÑ Process NIRÀº ¸Å¿ì È®½ÇÇÑ ÀåÁ¡À» °¡Áö°í ÀÖ´Ù. ¿©·¯ °¡Áö ´Ù¸¥ ŸÀÔÀÇ ¼ö¿ë¾× Cleaning ¿ë¾×¿¡µµ ¹ÏÀ»¸¸ÇÑ °á°ú¸¦ °¡Á®´Ù ÁÙ ¼ö ÀÖÀ¸¸ç, ´õ¿íÀÌ ½Ç½Ã°£À¸·Î in-situ ¹æ½ÄÀ¸·Î ÃøÁ¤Çϴµ¥ ¸Å¿ì ¼º°øÀûÀÎ °á°ú¸¦ °¡Á®´Ù ÁÖ¾ú´Ù. ù ¹ø° ÀåÁ¡Àº 80% ÀÌ»óÀÇ ³ôÀº ³óµµÀÌ´øÁö 1%ÀÇ ³·Àº ³óµµÀÌ´øÁö °£¿¡ ºÐ¼®ÀÌ °¡´ÉÇÏ´Ù. ¶ÇÇÑ Multi-component ºÐ¼®ÀÌ µ¿½Ã¿¡ °¡´ÉÇϱ⠶§¹®¿¡ ½Ç½Ã°£À¸·Î BathÀÇ Á¶°ÇÀ» °è¼ÓÇؼ­ ÀûÇÕÇÑ Á¶°ÇÀ» ¸ÂÃß¾î ÁÙ ¼ö ÀÖÀ¸¹Ç·Î, Cleaning & Etching Process¿¡ ¸Å¿ì ÀûÇÕÇÑ ºÐ¼®Àåºñ¶ó°í È®½ÅÇÒ ¼ö ÀÖ´Ù.